Huajun Liu obtained his PhD degree from the National University of Singapore and conducted postdoctoral research at the Argonne National Laboratory, US. He is currently Group Leader of the Oxide Lab at A*STAR IMRE, where he focuses on developing high-performance oxide thin films for next-generation microelectronics, particularly for 5G/6G wireless communications and low-power sensors. Liu has published as the first author or corresponding author in top research journals, including Nature and Science. He has been awarded the Charles Hatchett Award from the Institute of Materials, Minerals and Mining (UK) and was named an A*STAR Fellow for 2024. As a Principal Investigator, he has received prestigious funding grants, including the National Research Foundation (NRF) Competitive Research Programme (CRP) and the highly competitive Individual Research Grant (IRG).
